Publication detail

Optimization of Deposition Parameters of a DLC Layer Using (RF) PECVD Technology

PROKEŠ, T. MOURALOVÁ, K. ZAHRADNÍČEK, R. BEDNÁŘ, J. KALIVODA, M.

English title

Optimization of Deposition Parameters of a DLC Layer Using (RF) PECVD Technology

Type

Chapter in a book

Language

en

Original abstract

The aim of this study was to carry out a planned experiment (DoE) in order to find a suitable combination of deposition parameters to increase the hardness of the coating. In a 20-round experiment, parameters of chamber pressure, gas flow and the power of an RF source were gradually changed. Subsequently, a micro hardness analysis was carried out using the Berkovich method. Using the DoE method, a combination of parameters was detected within which a comparable hardness of the coating was achieved as with doping of the hydrogen atoms coating to increase the number of Sp3 carbon bonds. Within the indentation test, a scratch test was carried out to determine the normal force required to break the coating.

Keywords in English

DLC, RF PECVD, Coating hardness, scrath test, DoE, Berkovich

Released

2021-03-11

Publisher

Springer International Publishing

Location

Švýcarsko

ISBN

978-3-030-61659-5

ISSN

1434-9922

Book

Recent Advances in Soft Computing and Cybernetics

Volume

2021

Number

403

Pages from–to

53–62

Pages count

10

BIBTEX


@inbook{BUT157677,
  author="Tomáš {Prokeš} and Kateřina {Mouralová} and Radim {Zahradníček} and Josef {Bednář} and Milan {Kalivoda}",
  title="Optimization of Deposition Parameters of a DLC Layer Using (RF) PECVD Technology",
  booktitle="Recent Advances in Soft Computing and Cybernetics",
  year="2021",
  publisher="Springer International Publishing",
  address="Švýcarsko",
  pages="53--62",
  doi="10.1007/978-3-030-61659-5\{_}5https://link.springer.com/chapter/10.1007/978-3-030-61659-5\{_}5",
  isbn="978-3-030-61659-5",
  url="https://link.springer.com/chapter/10.1007/978-3-030-61659-5_5"
}