Publication detail

Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films

RAŠKOVÁ, Z. ŠORMOVÁ, H. HAVELKOVÁ, I. KRČMA, F. VANĚK, J. PŘIKRYL, R. ČECH, V.

English title

Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films

Type

journal article - other

Language

en

Original abstract

The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.

English abstract

The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.

Keywords in English

Plasma deposition, organosilicone layers, optical emission spectroscopy

RIV year

2003

Released

01.09.2003

Publisher

Sloveská Akadémia Ved

Location

Bratislava

ISSN

0323-0465

Journal

Acta Physica Slovaca

Volume

53

Number

5

Pages count

5

BIBTEX


@article{BUT41506,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech},
  title="Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films",
  journal="Acta Physica Slovaca",
  year="2003",
  volume="53",
  number="5",
  month="September",
  publisher="Sloveská Akadémia Ved",
  address="Bratislava",
  issn="0323-0465"
}