Publication detail

Oxygen Impurities in Ti-Si-N and Related Systems are Hindering the Phase Segregation, Formation of Stable Nanostructure and Degrading the Cutting Performance of Tools Coated with the Nanocomposites

VEPREK, S. PÍŠKA, M.

English title

Oxygen Impurities in Ti-Si-N and Related Systems are Hindering the Phase Segregation, Formation of Stable Nanostructure and Degrading the Cutting Performance of Tools Coated with the Nanocomposites

Type

Audiovisual work

Language

en

Original abstract

We have shown earlier, that an oxygen impurity content of more than0.4 at.p. (4000 ppm) strongly degrades the hardness of the nc-TiN/a-Si3N4 nanocomposites. Here we show that such impurities also hinder the phase segregation and formation of stable and strong nanostructure consisting of 3-4 nm size TiN nanocrystals "glued" together by about 1 monolayer thick interfacial Si3N4-like layer, thus apparently stabilizing the solid solution at high temperature of more 900C, as reported by other researchers. At the impurity content of only few hundred ppm, the segregation is completed, and a stable nanostructure formed at temperature less 550C. By decreasing the impurity content from 2000-3000 ppm down to about 1000 ppm in an industrial PVD coating equipment, the life time of cutting tools has been increased by a factor of 2.

Keywords in English

Superhard Nanocomposites; Impurities; Oxygen; Thermal Stability; TiSiN

Released

2011-07-24

Publisher

A.J. Drexel Plasma Institute

Location

Philadelphia USA

ISBN

9241562676

Book

20th International Symposium on Plasma Chemistry http://ispc20.plasmainstitute.org/

Pages from–to

54–57

Pages count

4

BIBTEX


@misc{BUT73916,
  author="Stan {Veprek} and Miroslav {Píška}",
  title="Oxygen Impurities in Ti-Si-N and Related Systems are Hindering the Phase Segregation, Formation of Stable Nanostructure and Degrading the Cutting Performance of Tools Coated with the Nanocomposites",
  booktitle="20th International Symposium on Plasma Chemistry http://ispc20.plasmainstitute.org/",
  year="2011",
  series="první",
  edition="1",
  pages="54--57",
  publisher="A.J. Drexel Plasma Institute",
  address="Philadelphia USA",
  isbn="9241562676",
  url="http://ispc20.plasmainstitute.org/",
  note="Audiovisual work"
}