Publication detail

Ellipsometry – a tool for surface and thin film analysis

TICHOPÁDEK, P. NEBOJSA, A. ČECHAL, J.

English title

Ellipsometry – a tool for surface and thin film analysis

Type

Paper in proceedings (conference paper)

Language

en

Original abstract

To study optical properties of solid surfaces under high temperatures we have designed an UHV apparatus consisting of an analytical chamber and a load chamber. The analytical chamber is pumped down by an ion pump to an ultimate background pressure of 10-7–10-8 Pa. Inside the chamber there is a manipulator carrying the substrate holder and oven designed for sample heating up to 1000C. The ellipsometer setup (angle of incidence is 67.5°) is fixed to two windows of the chamber. The paper deals with a basic description of theory, design and testing of a spectroscopic ellipsometer with the light halogen source in a wavelength interval of 350-750 nm and a simple fiber optical spectrometer with a diode array as a detector (Ocean Optics S 2000).

Released

2001-09-19

Publisher

Fakulta strojního inženýrství VUT v Brně

Location

Brno

Book

Juniormat '01 sborník

Pages from–to

102–

Pages count

4

BIBTEX


@inproceedings{BUT3355,
  author="Petr {Tichopádek} and Alois {Nebojsa} and Jan {Čechal}",
  title="Ellipsometry - a tool for surface and thin film analysis",
  booktitle="Juniormat '01 sborník",
  year="2001",
  pages="4",
  publisher="Fakulta strojního inženýrství VUT v Brně",
  address="Brno"
}