Detail publikace

Ellipsometry – a tool for surface and thin film analysis

TICHOPÁDEK, P. NEBOJSA, A. ČECHAL, J.

Anglický název

Ellipsometry – a tool for surface and thin film analysis

Typ

Stať ve sborníku v databázi WoS či Scopus

Jazyk

en

Originální abstrakt

To study optical properties of solid surfaces under high temperatures we have designed an UHV apparatus consisting of an analytical chamber and a load chamber. The analytical chamber is pumped down by an ion pump to an ultimate background pressure of 10-7–10-8 Pa. Inside the chamber there is a manipulator carrying the substrate holder and oven designed for sample heating up to 1000C. The ellipsometer setup (angle of incidence is 67.5°) is fixed to two windows of the chamber. The paper deals with a basic description of theory, design and testing of a spectroscopic ellipsometer with the light halogen source in a wavelength interval of 350-750 nm and a simple fiber optical spectrometer with a diode array as a detector (Ocean Optics S 2000).

Vydáno

2001-09-19

Nakladatel

Fakulta strojního inženýrství VUT v Brně

Místo

Brno

Kniha

Juniormat '01 sborník

Strany od–do

102–

Počet stran

4

BIBTEX


@inproceedings{BUT3355,
  author="Petr {Tichopádek} and Alois {Nebojsa} and Jan {Čechal}",
  title="Ellipsometry - a tool for surface and thin film analysis",
  booktitle="Juniormat '01 sborník",
  year="2001",
  pages="4",
  publisher="Fakulta strojního inženýrství VUT v Brně",
  address="Brno"
}