Publication detail

Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures

LOPOUR, F. ŠIKOLA, T. SPOUSTA, J. ŠKODA, D. MATĚJKA, F. KALOUSEK, R.

English title

Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures

Type

Peer-reviewed article not indexed in WoS or Scopus

Language

en

Original abstract

In the paper AFM studies of microstructures etched by ion beams into Si and Au surfaces, and AFM local anodic oxidation of Ti thin films is presented. Using the AFM technique the etching limits of inert atoms in production of silicon and silver grids were found. It was proved that the height of Ti oxide lines fabricated by AFM increases linearly with the voltage between a tip and a sample. On the other hand, the half-width of the lines did not depend linearly on this voltage. The results are useful for studies of quantum effects in nanostructures and experiments in fabrication of nanoelectronic devices (e.g. SET).

Released

2002-08-01

ISSN

0142-2421

Journal

SURFACE AND INTERFACE ANALYSIS

Volume

34

Number

1

Pages from–to

352–

Pages count

4

BIBTEX


@article{BUT40889,
  author="Filip {Lopour} and Tomáš {Šikola} and Jiří {Spousta} and David {Škoda} and František {Matějka} and Radek {Kalousek}",
  title="Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures",
  journal="SURFACE AND INTERFACE ANALYSIS",
  year="2002",
  volume="34",
  number="1",
  pages="4",
  issn="0142-2421"
}