Detail publikace

Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures

LOPOUR, F. ŠIKOLA, T. SPOUSTA, J. ŠKODA, D. MATĚJKA, F. KALOUSEK, R.

Anglický název

Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures

Typ

Článek recenzovaný mimo WoS a Scopus

Jazyk

en

Originální abstrakt

In the paper AFM studies of microstructures etched by ion beams into Si and Au surfaces, and AFM local anodic oxidation of Ti thin films is presented. Using the AFM technique the etching limits of inert atoms in production of silicon and silver grids were found. It was proved that the height of Ti oxide lines fabricated by AFM increases linearly with the voltage between a tip and a sample. On the other hand, the half-width of the lines did not depend linearly on this voltage. The results are useful for studies of quantum effects in nanostructures and experiments in fabrication of nanoelectronic devices (e.g. SET).

Vydáno

2002-08-01

ISSN

0142-2421

Časopis

SURFACE AND INTERFACE ANALYSIS

Ročník

34

Číslo

1

Strany od–do

352–

Počet stran

4

BIBTEX


@article{BUT40889,
  author="Filip {Lopour} and Tomáš {Šikola} and Jiří {Spousta} and David {Škoda} and František {Matějka} and Radek {Kalousek}",
  title="Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures",
  journal="SURFACE AND INTERFACE ANALYSIS",
  year="2002",
  volume="34",
  number="1",
  pages="4",
  issn="0142-2421"
}