Publication detail

Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method

OHLÍDAL, M. OHLÍDAL, I. FRANTA, D. KRÁLÍK, T. JÁKL, M. ELIÁŠ, M.

English title

Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method

Type

Peer-reviewed article not indexed in WoS or Scopus

Language

en

Original abstract

An original method enabling us to characterize the non-uniformity of thin-film thickness is decribed. This method employs the interpretation of data obtained by multiple-wavelength reflectometry. The values of the reflectance are measured for several wavelengths in many points lying along the area of the film. The spectral dependence of the refractive index of the material forming the film is determined using variable-angle spectroscopic ellipsometry.

Released

2002-08-01

ISSN

0142-2421

Journal

SURFACE AND INTERFACE ANALYSIS

Volume

34

Number

1

Pages from–to

660–

Pages count

4

BIBTEX


@article{BUT40936,
  author="Miloslav {Ohlídal} and Ivan {Ohlídal} and Daniel {Franta} and Tomáš {Králík} and Miloš {Jákl} and Marek {Eliáš}",
  title="Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method",
  journal="SURFACE AND INTERFACE ANALYSIS",
  year="2002",
  volume="34",
  number="1",
  pages="4",
  issn="0142-2421"
}