Detail publikace

Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method

OHLÍDAL, M. OHLÍDAL, I. FRANTA, D. KRÁLÍK, T. JÁKL, M. ELIÁŠ, M.

Anglický název

Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method

Typ

Článek recenzovaný mimo WoS a Scopus

Jazyk

en

Originální abstrakt

An original method enabling us to characterize the non-uniformity of thin-film thickness is decribed. This method employs the interpretation of data obtained by multiple-wavelength reflectometry. The values of the reflectance are measured for several wavelengths in many points lying along the area of the film. The spectral dependence of the refractive index of the material forming the film is determined using variable-angle spectroscopic ellipsometry.

Vydáno

2002-08-01

ISSN

0142-2421

Časopis

SURFACE AND INTERFACE ANALYSIS

Ročník

34

Číslo

1

Strany od–do

660–

Počet stran

4

BIBTEX


@article{BUT40936,
  author="Miloslav {Ohlídal} and Ivan {Ohlídal} and Daniel {Franta} and Tomáš {Králík} and Miloš {Jákl} and Marek {Eliáš}",
  title="Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method",
  journal="SURFACE AND INTERFACE ANALYSIS",
  year="2002",
  volume="34",
  number="1",
  pages="4",
  issn="0142-2421"
}