Publication detail

Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

VOBORNÝ, S. MACH, J. ČECHAL, J. KOSTELNÍK, P. TOMANEC, O. BÁBOR, P. SPOUSTA, J. ŠIKOLA, T.

English title

Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

Type

Peer-reviewed article not indexed in WoS or Scopus

Language

en

Original abstract

Paper deals with the application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

Released

2004-01-01

ISSN

0447-6441

Journal

Jemná mechanika a optika

Volume

9

Number

9

Pages from–to

265–

Pages count

5

BIBTEX


@article{BUT42366,
  author="Stanislav {Voborný} and Jindřich {Mach} and Jan {Čechal} and Petr {Kostelník} and Ondřej {Tomanec} and Petr {Bábor} and Jiří {Spousta} and Tomáš {Šikola}",
  title="Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth",
  journal="Jemná mechanika a optika",
  year="2004",
  volume="9",
  number="9",
  pages="5",
  issn="0447-6441"
}