Publication detail

Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam

RITUCCI, A. –TOMASSETTI, G. –REALE, A. –ARIZZA, L. –ZUPELLA, P. –REALE, L. –PALLADINO, L.–FLORA, F. –BONFIGLI, E. –FAENOV, A. –PIKUZ, T. –KAISER, J. –NILSEN, J. –JANKOWSKI, A.F.

English title

Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam

Type

Peer-reviewed article not indexed in WoS or Scopus

Language

en

Original abstract

We applied a 0.3 mJ, 1.7 ns, 46.9 nm soft X-ray argon laser to ablate the surface of large bandgap dielectrics:CaF2 and LiF crystals.

Released

2006-01-01

ISSN

0146-9592

Journal

OPTICS LETTERS

Volume

31

Number

1

Pages from–to

68–

Pages count

3

BIBTEX


@article{BUT42576,
  author="Jozef {Kaiser}",
  title="Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam",
  journal="OPTICS LETTERS",
  year="2006",
  volume="31",
  number="1",
  pages="3",
  issn="0146-9592"
}