Detail publikace

Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam

RITUCCI, A. –TOMASSETTI, G. –REALE, A. –ARIZZA, L. –ZUPELLA, P. –REALE, L. –PALLADINO, L.–FLORA, F. –BONFIGLI, E. –FAENOV, A. –PIKUZ, T. –KAISER, J. –NILSEN, J. –JANKOWSKI, A.F.

Anglický název

Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam

Typ

Článek recenzovaný mimo WoS a Scopus

Jazyk

en

Originální abstrakt

We applied a 0.3 mJ, 1.7 ns, 46.9 nm soft X-ray argon laser to ablate the surface of large bandgap dielectrics:CaF2 and LiF crystals.

Vydáno

2006-01-01

ISSN

0146-9592

Časopis

OPTICS LETTERS

Ročník

31

Číslo

1

Strany od–do

68–

Počet stran

3

BIBTEX


@article{BUT42576,
  author="Jozef {Kaiser}",
  title="Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam",
  journal="OPTICS LETTERS",
  year="2006",
  volume="31",
  number="1",
  pages="3",
  issn="0146-9592"
}