Publication detail

Quantitative analysis of ultra thin layer growth by time-of-flight low energy ion scattering

PRIMETZHOFER, D. MARKIN, S. ZEPPENFELD, P. BAUER, P. PRŮŠA, S. KOLÍBAL, M. ŠIKOLA, T.

English title

Quantitative analysis of ultra thin layer growth by time-of-flight low energy ion scattering

Type

Peer-reviewed article not indexed in WoS or Scopus

Language

en

Original abstract

Time of flight low energy ion scattering is used to quantitatively characterize the growth mode of Au deposited on B. Information on the filling factor (surface area coverage) is deduced from the yield of backscattered ions and the spectrum height of scattered neutrals. From the variation of the filling factor with the nominal Au thickness, cluster growth is deduced. Information on the average cluster height is obtained from the energy distribution of scattered neutrals and the comparison with computer simulation. Finally, an estimate of the aspect ratios is obtained for the clusters from the filling factor and the cluster height.

Keywords in English

Low energy ion scattering, LEIS; Time-of-flight, ToF; Quantitative analysis

Released

2008-01-11

ISSN

0003-6951

Journal

Applied Physics Letters

Volume

92

Number

1

Pages from–to

011929-1–011929-3

Pages count

3