Detail publikace
Quantitative analysis of ultra thin layer growth by time-of-flight low energy ion scattering
PRIMETZHOFER, D. MARKIN, S. ZEPPENFELD, P. BAUER, P. PRŮŠA, S. KOLÍBAL, M. ŠIKOLA, T.
Anglický název
Quantitative analysis of ultra thin layer growth by time-of-flight low energy ion scattering
Typ
Článek recenzovaný mimo WoS a Scopus
Jazyk
en
Originální abstrakt
Time of flight low energy ion scattering is used to quantitatively characterize the growth mode of Au deposited on B. Information on the filling factor (surface area coverage) is deduced from the yield of backscattered ions and the spectrum height of scattered neutrals. From the variation of the filling factor with the nominal Au thickness, cluster growth is deduced. Information on the average cluster height is obtained from the energy distribution of scattered neutrals and the comparison with computer simulation. Finally, an estimate of the aspect ratios is obtained for the clusters from the filling factor and the cluster height.
Klíčová slova anglicky
Low energy ion scattering, LEIS; Time-of-flight, ToF; Quantitative analysis
Vydáno
2008-01-11
ISSN
0003-6951
Časopis
Applied Physics Letters
Ročník
92
Číslo
1
Strany od–do
011929-1–011929-3
Počet stran
3