Publication detail

Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography

OTTAVIANO, L. BUSSOLOTTI, F. PIPERNO, S. RINALDI, M. SANTUCCI, S. FLORA, F. MEZI, L. DUNNE, P. KAISER, J. REALE, A. RITUCCI, A. ZUPPELA, P.

English title

Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography

Type

Peer-reviewed article not indexed in WoS or Scopus

Language

en

Original abstract

An extremely promising complete nanofabrication process of metallic patterns, to achieve periodic structure resolution well below 100 nm, has been successfully demonstrated. The process includes the EUV patterning encoding on the photoresist and its transfer from the polymer onto a Si substrate using a 46.9 nm table top soft x-ray laser and an interference lithography scheme. After optimizing the PMMA poly(methyl methacrylate) preparation thickness and development, by controlling the metal deposition and subsequent liftoff process on the exposed PMMA/SiO2/Si(1 0 0) samples, we have fabricated large arrays of 200 nm spaced nickel strips on Si surfaces.

Keywords in English

soft X-ray laser, interferometric litography, metallic micropatterns

Released

2008-05-01

ISSN

0963-0252

Journal

Plasma sources science & technology

Volume

17

Number

2

Pages from–to

24019–24023

Pages count

4

BIBTEX


@article{BUT48119,
  author="OTTAVIANO, L. and BUSSOLOTTI, F. and PIPERNO, S. and RINALDI, M. and SANTUCCI, S. and FLORA, F. and MEZI, L. and DUNNE, P. and KAISER, J. and REALE, A. and RITUCCI, A., ZUPPELA, P.",
  title="Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography",
  journal="Plasma sources science & technology",
  year="2008",
  volume="17",
  number="2",
  pages="24019--24023",
  issn="0963-0252"
}