Detail publikace

Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography

OTTAVIANO, L. BUSSOLOTTI, F. PIPERNO, S. RINALDI, M. SANTUCCI, S. FLORA, F. MEZI, L. DUNNE, P. KAISER, J. REALE, A. RITUCCI, A. ZUPPELA, P.

Anglický název

Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography

Typ

Článek recenzovaný mimo WoS a Scopus

Jazyk

en

Originální abstrakt

An extremely promising complete nanofabrication process of metallic patterns, to achieve periodic structure resolution well below 100 nm, has been successfully demonstrated. The process includes the EUV patterning encoding on the photoresist and its transfer from the polymer onto a Si substrate using a 46.9 nm table top soft x-ray laser and an interference lithography scheme. After optimizing the PMMA poly(methyl methacrylate) preparation thickness and development, by controlling the metal deposition and subsequent liftoff process on the exposed PMMA/SiO2/Si(1 0 0) samples, we have fabricated large arrays of 200 nm spaced nickel strips on Si surfaces.

Klíčová slova anglicky

soft X-ray laser, interferometric litography, metallic micropatterns

Vydáno

2008-05-01

ISSN

0963-0252

Časopis

Plasma sources science & technology

Ročník

17

Číslo

2

Strany od–do

24019–24023

Počet stran

4

BIBTEX


@article{BUT48119,
  author="OTTAVIANO, L. and BUSSOLOTTI, F. and PIPERNO, S. and RINALDI, M. and SANTUCCI, S. and FLORA, F. and MEZI, L. and DUNNE, P. and KAISER, J. and REALE, A. and RITUCCI, A., ZUPPELA, P.",
  title="Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography",
  journal="Plasma sources science & technology",
  year="2008",
  volume="17",
  number="2",
  pages="24019--24023",
  issn="0963-0252"
}