Publication detail

Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry

OHLÍDAL, I. OHLÍDAL, M. NEČAS, D. FRANTA, D. BURŠÍKOVÁ, V.

English title

Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry

Type

WoS Article

Language

en

Original abstract

The combined optical method enabling us to perform the complete optical characterisation of weakly absorbing non-uniform thin films is described. This method is based on the combination of standard variable angle spectroscopic ellipsometry, standard spectroscopic reflectometry at near normal incidence and spectroscopic imaging reflectometry applied at normal incidence. The spectral dependences of the optical constants are determined using the non-imaging methods by using the dispersion model based on parametrisation of the density of electronic states. The local thickness distribution is then determined by imaging reflectometry. The method is illustrated by means of the complete optical characterisation of SiOxCyHz thin films.

Keywords in English

Optical characterisation; Non-uniform films; Spectroscopic ellipsometry; Spectroscopic reflectometry; Spectroscopic imaging reflectometry

Released

2011-02-28

Publisher

ELSEVIER SCIENCE SA

Location

LAUSANNE

ISSN

0040-6090

Journal

Thin Solid Films

Volume

519

Number

9

Pages from–to

2874–2876

Pages count

3

BIBTEX


@article{BUT50347,
  author="Ivan {Ohlídal} and Miloslav {Ohlídal} and David {Nečas} and Daniel {Franta} and Vilma {Buršíková}",
  title="Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry",
  journal="Thin Solid Films",
  year="2011",
  volume="519",
  number="9",
  pages="2874--2876",
  issn="0040-6090"
}