Detail publikace

Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry

OHLÍDAL, I. OHLÍDAL, M. NEČAS, D. FRANTA, D. BURŠÍKOVÁ, V.

Anglický název

Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry

Typ

Článek WoS

Jazyk

en

Originální abstrakt

The combined optical method enabling us to perform the complete optical characterisation of weakly absorbing non-uniform thin films is described. This method is based on the combination of standard variable angle spectroscopic ellipsometry, standard spectroscopic reflectometry at near normal incidence and spectroscopic imaging reflectometry applied at normal incidence. The spectral dependences of the optical constants are determined using the non-imaging methods by using the dispersion model based on parametrisation of the density of electronic states. The local thickness distribution is then determined by imaging reflectometry. The method is illustrated by means of the complete optical characterisation of SiOxCyHz thin films.

Klíčová slova anglicky

Optical characterisation; Non-uniform films; Spectroscopic ellipsometry; Spectroscopic reflectometry; Spectroscopic imaging reflectometry

Vydáno

2011-02-28

Nakladatel

ELSEVIER SCIENCE SA

Místo

LAUSANNE

ISSN

0040-6090

Časopis

Thin Solid Films

Ročník

519

Číslo

9

Strany od–do

2874–2876

Počet stran

3

BIBTEX


@article{BUT50347,
  author="Ivan {Ohlídal} and Miloslav {Ohlídal} and David {Nečas} and Daniel {Franta} and Vilma {Buršíková}",
  title="Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry",
  journal="Thin Solid Films",
  year="2011",
  volume="519",
  number="9",
  pages="2874--2876",
  issn="0040-6090"
}