Publication detail

An in situ study of processes taking place on a silicon surface during bombardment by CFx/Ar ions – etching versus polymerization

ŠIKOLA, T. ARMOUR, D. VAN DEN BERG, J.

English title

An in situ study of processes taking place on a silicon surface during bombardment by CFx/Ar ions – etching versus polymerization

Type

Chapter in a book

Language

en

Released

1994-01-01

Publisher

Institut für Ionenphysik, Universität Innsbruck

Location

Hintermoos/Maria Alm, Univ. Innsbruck,

Book

SASP 94 – Symposium on atomic, cluster and surface physics

Pages from–to

322–

Pages count

7

BIBTEX


@inbook{BUT51967,
  author="Tomáš {Šikola} and Dave {Armour} and Jaap {Van den berg}",
  title="An in situ study of processes taking place on a silicon surface during bombardment by CFx/Ar ions - etching versus polymerization",
  booktitle="SASP 94 - Symposium on atomic, cluster and surface physics",
  year="1994",
  publisher="Institut für Ionenphysik, Universität Innsbruck",
  address="Hintermoos/Maria Alm, Univ.  Innsbruck,",
  pages="7",
  isbn="0"
}