Detail publikace

An in situ study of processes taking place on a silicon surface during bombardment by CFx/Ar ions – etching versus polymerization

ŠIKOLA, T. ARMOUR, D. VAN DEN BERG, J.

Anglický název

An in situ study of processes taking place on a silicon surface during bombardment by CFx/Ar ions – etching versus polymerization

Typ

Kapitola, resp. kapitoly v odborné knize

Jazyk

en

Vydáno

1994-01-01

Nakladatel

Institut für Ionenphysik, Universität Innsbruck

Místo

Hintermoos/Maria Alm, Univ. Innsbruck,

Kniha

SASP 94 – Symposium on atomic, cluster and surface physics

Strany od–do

322–

Počet stran

7

BIBTEX


@inbook{BUT51967,
  author="Tomáš {Šikola} and Dave {Armour} and Jaap {Van den berg}",
  title="An in situ study of processes taking place on a silicon surface during bombardment by CFx/Ar ions - etching versus polymerization",
  booktitle="SASP 94 - Symposium on atomic, cluster and surface physics",
  year="1994",
  publisher="Institut für Ionenphysik, Universität Innsbruck",
  address="Hintermoos/Maria Alm, Univ.  Innsbruck,",
  pages="7",
  isbn="0"
}