Publication detail

TCAD tools in process and device simulation

RECMAN, M.

English title

TCAD tools in process and device simulation

Type

conference paper

Language

en

Original abstract

The enormous power of today`s computers has enabled the TCAD (Technology CAD) to become a workhorse of microelectronics progress. The development of sophisticated and efficient one-, two- and three-dimensional semiconductor process and device software tools will provide the engineers significant leverage in conducting research into new areas of IC technologies. The contribution reviews process and device simulation tools in common use and deals with the required features of the new TCAD tools generation.

English abstract

The enormous power of today`s computers has enabled the TCAD (Technology CAD) to become a workhorse of microelectronics progress. The development of sophisticated and efficient one-, two- and three-dimensional semiconductor process and device software tools will provide the engineers significant leverage in conducting research into new areas of IC technologies. The contribution reviews process and device simulation tools in common use and deals with the required features of the new TCAD tools generation.

Keywords in English

TCAD, process simulation, device simulation,

RIV year

2002

Released

01.01.2002

Publisher

Ing. Z. Novotny, Brno 2002

Location

Brno

ISBN

80-214-2180-0

Book

Electronics Devices and Systems EDS02. Proceedings.

Pages count

6

BIBTEX


@inproceedings{BUT5535,
  author="Milan {Recman},
  title="TCAD tools in process and device simulation",
  booktitle="Electronics Devices and Systems EDS02. Proceedings.",
  year="2002",
  month="January",
  publisher="Ing. Z. Novotny, Brno 2002",
  address="Brno 
",
  isbn="80-214-2180-0"
}