Detail publikace

TCAD tools in process and device simulation

RECMAN, M.

Anglický název

TCAD tools in process and device simulation

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

en

Originální abstrakt

The enormous power of today`s computers has enabled the TCAD (Technology CAD) to become a workhorse of microelectronics progress. The development of sophisticated and efficient one-, two- and three-dimensional semiconductor process and device software tools will provide the engineers significant leverage in conducting research into new areas of IC technologies. The contribution reviews process and device simulation tools in common use and deals with the required features of the new TCAD tools generation.

Anglický abstrakt

The enormous power of today`s computers has enabled the TCAD (Technology CAD) to become a workhorse of microelectronics progress. The development of sophisticated and efficient one-, two- and three-dimensional semiconductor process and device software tools will provide the engineers significant leverage in conducting research into new areas of IC technologies. The contribution reviews process and device simulation tools in common use and deals with the required features of the new TCAD tools generation.

Klíčová slova anglicky

TCAD, process simulation, device simulation,

Rok RIV

2002

Vydáno

01.01.2002

Nakladatel

Ing. Z. Novotny, Brno 2002

Místo

Brno

ISBN

80-214-2180-0

Kniha

Electronics Devices and Systems EDS02. Proceedings.

Počet stran

6

BIBTEX


@inproceedings{BUT5535,
  author="Milan {Recman},
  title="TCAD tools in process and device simulation",
  booktitle="Electronics Devices and Systems EDS02. Proceedings.",
  year="2002",
  month="January",
  publisher="Ing. Z. Novotny, Brno 2002",
  address="Brno 
",
  isbn="80-214-2180-0"
}