Publication detail

Application of ToF – LEIS for Analysis of Surfaces and Ultra Thin Films

PRŮŠA, S. ŠIKOLA, T. BÁBOR, P.

English title

Application of ToF – LEIS for Analysis of Surfaces and Ultra Thin Films

Type

Paper in proceedings (conference paper)

Language

en

Original abstract

Low Energy Ion Scattering (LEIS) belongs to a wide group of surface science analytical techniques. Low detection limit and extreme surface sensitivity are the main advantages of LEIS. Atomic composition of analysed surfaces is determined from the energy distribution of the scattered rare gas ions. Their kinetic energy can be measured by a Time-of-Flight (ToF) spectrometer. Capabilities of the ToF LEIS spectrometer will be demonstrated at analysis of gallium layers evaporated on a SiO2 substrate

Released

2001-11-15

Publisher

FEI VUT v Brně

Location

Brno

ISBN

80-214-1992-X

Book

Sborník příspěvků konference Nové trendy ve fyzice

Pages from–to

404–

Pages count

6

BIBTEX


@inproceedings{BUT6506,
  author="Stanislav {Průša} and Tomáš {Šikola} and Petr {Bábor}",
  title="Application of ToF - LEIS for Analysis of Surfaces and Ultra Thin Films",
  booktitle="Sborník příspěvků konference Nové trendy ve fyzice",
  year="2001",
  pages="6",
  publisher="FEI VUT v Brně",
  address="Brno",
  isbn="80-214-1992-X"
}