Detail publikace
Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry
NEČAS, D. ČUDEK, V. VODÁK, J. OHLÍDAL, M. KLAPETEK, P. ZAJÍČKOVÁ, L.
Anglický název
Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry
Typ
Článek WoS
Jazyk
en
Originální abstrakt
The construction of a normal-incidence imaging spectrophotometer for mapping of thin film properties is described. It is based on an on-axis reflective imaging system, utilising a telescope-like arrangement. A charge-coupled device camera is used as the detector, permitting measurements in the spectral range of 275-1100 nm with resolution of 37 square micrometers. The performance of the instrument is demonstrated by optical characterisation of highly non-uniform thin films deposited from hexamethyldisiloxane on silicon substrates by a single capillary plasma jet at atmospheric pressure. The imaging spectrophotometry is used as a self-sufficient technique for the determination of both the film optical constants and maps of local thickness. The thickness maps are compared with the results of conventional thickness profile characterisation methods, profilometry and atomic force microscopy and the differences and errors are discussed.
Klíčová slova anglicky
imaging spectrophotometry; micro-plasma jet; non-uniform thin films; optical properties; thickness mapping
Vydáno
2014-10-13
Nakladatel
IOP PUBLISHING LTD
Místo
TEMPLE CIRCUS, TEMPLE WAY, BRISTOL BS1 6BE, ENGLAND
ISSN
0957-0233
Časopis
Measurement Science and Technology
Ročník
25
Číslo
11
Strany od–do
1–9
Počet stran
9
BIBTEX
@article{BUT109014,
author="David {Nečas} and Vladimír {Čudek} and Jiří {Vodák} and Miloslav {Ohlídal} and Petr {Klapetek} and Lenka {Zajíčková}",
title="Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry",
journal="Measurement Science and Technology",
year="2014",
volume="25",
number="11",
pages="1--9",
doi="10.1088/0957-0233/25/11/115201",
issn="0957-0233"
}