Detail publikace

New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

OHLÍDAL, M. OHLÍDAL, I. KLAPETEK, P. JÁKL, M. ČUDEK, V. ELIÁŠ, M.

Anglický název

New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

Typ

Článek recenzovaný mimo WoS a Scopus

Jazyk

en

Originální abstrakt

A new optical method for characterizing thin films exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of reflectance measured using the special experimental arrangement described in detail. Using the method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin film studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the film studied.

Klíčová slova anglicky

films nonuniform in optical parameters, optical characterization

Vydáno

2003-07-01

ISSN

0021-4922

Časopis

JAPANESE JOURNAL OF APPLIED PHYSICS

Ročník

2003

Číslo

7B

Strany od–do

4760–

Počet stran

4

BIBTEX


@article{BUT42041,
  author="Miloslav {Ohlídal} and Ivan {Ohlídal} and Petr {Klapetek} and Miloš {Jákl} and Vladimír {Čudek} and Marek {Eliáš}",
  title="New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters",
  journal="JAPANESE JOURNAL OF APPLIED PHYSICS",
  year="2003",
  volume="2003",
  number="7B",
  pages="4",
  issn="0021-4922"
}