Detail publikace
Application of TOF – LEIS and XPS for Surface Studies.
PRŮŠA, S. ŠIKOLA, T. SPOUSTA, J. VOBORNÝ, S. BÁBOR, P. JURKOVIČ, P. ČECHAL, J.
Anglický název
Application of TOF – LEIS and XPS for Surface Studies.
Typ
Stať ve sborníku v databázi WoS či Scopus
Jazyk
en
Originální abstrakt
In the contribution complementary experiments on analysis of surfaces using time-of-flight low energy ion scattering (TOF-LEIS) and x-ray photoelectron spectroscopy (XPS) will be presented. The attention will be paid both to analysis of surfaces and ultra-thin films (e.g. Ga) prepared in situ under UHV conditions. The advantages of simultaneous application of two complementary techniques to surface analysis will be clearly demonstrated.
Vydáno
2001-06-27
Nakladatel
Vutium
Místo
Brno
ISBN
80-214-1892-3
Kniha
Materials Structure & Micromechanics of Fracture (MSMF-3)
Strany od–do
486–
Počet stran
8
BIBTEX
@inproceedings{BUT6287,
author="Stanislav {Průša} and Tomáš {Šikola} and Jiří {Spousta} and Stanislav {Voborný} and Petr {Bábor} and Patrik {Jurkovič} and Jan {Čechal}",
title="Application of TOF - LEIS and XPS for Surface Studies.",
booktitle="Materials Structure & Micromechanics of Fracture (MSMF-3)",
year="2001",
pages="8",
publisher="Vutium",
address="Brno",
isbn="80-214-1892-3"
}