Detail publikace

Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures

LOPOUR, F. ŠIKOLA, T. SPOUSTA, J. KALOUSEK, R. MATĚJKA, F. ŠKODA, D.

Anglický název

Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures

Typ

Stať ve sborníku v databázi WoS či Scopus

Jazyk

en

Originální abstrakt

In the paper AFM studies of microstructures etched by ion beams into Si and Au surfaces, and AFM local anodic oxidation of Ti thin films is presented. Using the AFM technique the etching limits of inert atoms in production of silicon and silver grids were found. It was proved that the height of Ti oxide lines fabricated by AFM increases linearly with the voltage between a tip and a sample. On the other hand, the half-width of the lines did not depend linearly on this voltage. The results are useful for studies of quantum effects in nanostructures and experiments in fabrication of nanoelectronic devices (e.g. SET).

Vydáno

2001-09-30

Nakladatel

P. Marcus, A. Galtayries, N. Frémy

Místo

Avignon, France

Kniha

9th European Conference on Applications of Surface and Interface Analysis (ECASIA'01) Book of Abstracts

Strany od–do

320–

Počet stran

1

BIBTEX


@inproceedings{BUT6953,
  author="Filip {Lopour} and Tomáš {Šikola} and Jiří {Spousta} and Radek {Kalousek} and František {Matějka} and David {Škoda}",
  title="Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures",
  booktitle="9th European Conference on Applications of Surface and Interface Analysis (ECASIA'01) Book of Abstracts",
  year="2001",
  pages="1",
  publisher="P. Marcus, A. Galtayries, N. Frémy",
  address="Avignon, France"
}