Detail publikace
Grain Contrast Imaging in UHV SLEEM
MIKMEKOVÁ, Š. HOVORKA, M. MÜLLEROVÁ, I. MAN, O. PANTĚLEJEV, L. FRANK, L.
Anglický název
Grain Contrast Imaging in UHV SLEEM
Typ
Článek recenzovaný mimo WoS a Scopus
Jazyk
en
Originální abstrakt
Study of the grain structure in the equal channel angular pressing processed copper by means of the cathode lens equipped ultrahigh vacuum scanning low energy electron microscope is reported. The grain contrast was found achieving its maximum at electron energies below about 30 eV where it alternated its sign and exhibited dependence on electron energy specific for the grain orientation. The energy dependence of the electron reflectance seemed to be capable of serving as a fingerprint enabling determination of the crystalline orientation. In the cathode lens mode at hundreds of eV fine details of the microstructure are also observable including twins and low angle grain boundaries. This is explained by acquisition of high-angle backscattered slow electrons, normally not acquired in standard scanning electron microscopes. The very low energy electron reflectance is promising as an alternative to the EBSD method owing to its high resolution and fast data acquisition.
Klíčová slova anglicky
scanning low energy electron microscopy, electron backscatter diffraction (EBSD), grain contrast, ultra-fine grained materials
Vydáno
2010-01-25
Nakladatel
The Japan Institute of Metals
Místo
Ichibancho, Aoba-ku, Sendai 980-8544, Japan
ISSN
1345-9678
Časopis
MATERIALS TRANSACTIONS
Ročník
51
Číslo
2
Strany od–do
292–296
Počet stran
5
BIBTEX
@article{BUT48741,
author="Šárka {Mikmeková} and Miloš {Hovorka} and Ilona {Müllerová} and Ondřej {Man} and Libor {Pantělejev} and Luděk {Frank}",
title="Grain Contrast Imaging in UHV SLEEM",
journal="MATERIALS TRANSACTIONS",
year="2010",
volume="51",
number="2",
pages="292--296",
issn="1345-9678"
}